UV-LED can be used in agriculture, banknote identification, resin hardening, special biomedical and other fields. The market prospect is promising, but currently high-power UV-LED uses indium tin oxide (ITO) as a transparent conductive film, which will cause poor heat dissipation. Problems with uneven current distribution affect its luminous efficiency.
The instrument center and the Central University of Science and Technology, and the Central Science and Technology Park Administration of the Ministry of Science and Technology, supported the high-tech equipment forward-looking technology development plan, and jointly implemented the “Development of Plasma-Assisted High-Speed ​​Atomic Layer Deposition System for UV-LED†program. Graphene, which is a transparent electrode material suitable for LEDs, replaces indium tin oxide, and it is desirable to overcome the problem of reduced luminous efficiency of UV-LEDs.
There are two key technologies in this research. One is to allow graphene at a low temperature process (about 600 ° C) to be directly formed on a platinum film to make an electrode. Prof. Li Zhengzhong and Assistant Professor Guo Qianyu of the Central University Film Technology Center are responsible for the development of graphene low temperature process. The instrument center is responsible for the production of graphene directly on the platinum film (this is the “plasma assisted high temperature atomic layer deposition systemâ€).
The second key technology is to make this electrode perfectly integrated with the LED's luminescent layer, which was jointly developed by the Instrument Center and Epistar.
The initial cooperation will be tested and verified in the Jingguang factory. After the technology is mature, the technology center of the Center for Membrane and the Central University Film Technology Center will be transferred to the equipment manufacturers for related equipment manufacturing.
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